EnerStream
DC Power Supply
Your solution for DC Plasma Processing
Applications
- Semiconductor wafer sputtering (PVD)
- TFT LCD
- OLED LTPS sputter metal & TCO deposition
- Thin film for solar cells
- Mobile phone cases
- ITO deposition for touch panels
- Automotive wheels and headlamps
- Ion nitriding
- BIPV, data storage and FCCL
Parallel Operation
- Maximum parallel operation of 12 ea (master 1 ea + slave 11 ea)
- Maximum output of 480 kW (EnerStream 60: maximum parallel of 8 ea)
Key Specifications
Arc Management
Voltage, Current or dv/dt Arc Suppression
Voltage Arc Suppression